Description

Rotatable targets are specially shaped sputtering targets that are manufactured as cylindrical or tubular bodies. In contrast to classic planar targets, they enable large-area, uniform coating, especially with rotating cathode systems. The external geometry is precisely adapted to the requirements of the respective coating systems.

Form

  • Cylindrical or tubular

  • Uniform wall thickness (straight) or larger outer diameter at the ends (dogbone)

  • Available as monolithic, sprayed or bonded materials (e.g. metals or ceramics) 

  • Typical dimensions: customizable depending on the system and application

Sputter Targets all
Sputter Targets all
Sputter Targets AZO
Sputter Targets AZO
Sputter Targets ITO
Sputter Targets ITO
Sputter Targets NiV
Sputter Targets NiV
Sputter Targets Si
Sputter Targets Si
Sputter Targets SiAl
Sputter Targets SiAl
Sputter Targets Ta2OS
Sputter Targets Ta2OS
BENEFITS

High material utilization

By rotating the target during the sputtering process, the target material is used more efficiently than with planar targets.

Homogeneous layer thickness

The rotation improves the homogeneity of the deposited layers on the substrate.

Longer service life

Reduced time for target change  and longer operating cycles increase productivity.

Large coating areas

Ideal for industrial high-volume and flat glass coating

Flexible choice of material

Available in metals, alloys, oxides, nitrides and other composite materials

Applications
Big city with many lights and glass facades from a distance

Architectural Glass & Automotive Glass
Architectural Glass, Automotive Glass, Solar Glass, Displays, Smart Glass

Elektronik Halbleiter Elemente auf Leiterplatte

Electronics & Semiconductors
Optoelectronics, Advanced Packaging, Power Electronics, Photonics

Solar field in light

Photovoltaics
Thin-Film Photovoltaics (z. B. CIGS, CdTe)

Red rays in front of lens

Optics
Optical Anti-Reflection Coatings, Filters, Mirrors, Protective Layers

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