Description
Round planar targets are flat, circular sputtering targets that are used for a variety of coating processes. They offer precise material release and are ideal for classic magnetron sputtering processes, especially in smaller or specialized coating systems.
Form
- Flat, circular geometry (disk shape)
- Standard sizes or customer-specific adaptations possible
- Available in different diameters and thicknesses
BENEFITS
High material purity
Ideal for high-end applications with highest quality requirements
Homogeneous layer thickness
Optimum planarity ensures homogneous coatings
Flexibility
Wide range of materials and alloys available
Easy handling
Compatible with common holder systems and easy to install
Applications
Displays
Optoelectronics, OLED, Sensor Technology
Electronics & Semiconductors
Power Electronics, Photonics, Sensors
Medical Technology
Thin-Film Implants, Biocompatible Coatings
